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B 901 |
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| Sample holder | Rotary, with one degree of freedom |
| Residual pressure | 10-4 Pa |
| Chamber equipment | 4 independent magnetron sputtering sources
(max. power 10 kW each) |
| Gas supply | Inert | Ar |
| Reactive | N2, C2H2, O2, CH4 |
| Sample cleaning method | Glow discharge under reduced pressure in Ar atmosphere |
| Sample bias | 0 - 400V |
| Other | Specimen heating up to 473K |
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URM 079 |
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| Sample holder | Rotary, with two degrees of freedom
(60 independent axis for samples) |
| Residual pressure | 10-4 Pa |
| Chamber equipment |
- 2 continuous arc sources of metal plasma
(arc current up to 180 A)
- 2 pulsed arc sources of carbon plasma
(mean power of the carbon arc discharge 1 kW)
- 1 magnetron sputtering source (max. power 10 kW)
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| Gas supply | Inert | Ar |
| Reactive | N2, C2H2, O2, CH4 |
| Sample cleaning method | - 4 Ar ion beams
(max. Ar ion energy - 4keV each,
without specimen bias) - Me ions from arc evaporators
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| Sample bias | - High: 800 - 2500V
- Low: 0 - 200V
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| Other | Specimen heating up to 723K |
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SP 2000 |
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| Residual pressure | 10-4 Pa |
| Chamber equipment |
1 magnetron sputtering source (max. power 10 kW) |
| Gas supply | Inert | Ar |
| Reactive | N2, C2H2, O2, CH4 |
| Sample cleaning method |
Glow discharge under reduced pressure in Ar atmosphere |
| Sample bias | 0 - 400V |
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Vacuum Furnaces |
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| Quartz tube inner diameter | 80 mm or 110 mm |
| Residual pressure | 10-3 Pa |
| Max. temperature |
1473K |
| Gas supply | Inert | Ar |
| Reactive | N2, C2H2, O2, CH4 |
| Additional equipment |
Glow discharge supply for plasma treatment of specimen surface |
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Thermogravimetry: Furnace with Balance |
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Basic Invesigation Equipment |
 | Olimpus Optical Microscope |
| Calotester |  |
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Interference Microscope |
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